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Universitas Teknologi Kimia Beijing Mengumumkan Paten Untuk Fotoinisiator Turunan Hidrogen-donor Thioether Naftalimida Cocok Untuk Penyembuhan Aerobik UV-LED

Jan 01, 2022

Baru-baru ini, Universitas Teknologi Kimia Beijing mengumumkan paten untuk penemuan fotoinisiator turunan-sumbangan sulfida naftalimida yang cocok untuk pengawetan aerobik UVLED.

1639990436599233

This invention patent discloses a hydrogen-donating thioether naphthalimide derivative photoinitiator suitable for aerobic curing of UVLED, which relates to the field of photosensitive polymers. It is based on the use of existing photoinitiators in UVLED light sources Under irradiation, the problem of poor performance in the presence of oxygen is proposed; the present invention prepares a type of hydrogen donor-containing thioether-type naphthalimide derivative photoinitiator, and provides the above-mentioned hydrogen-containing donor The preparation method of the thioether naphthalimide derivative photoinitiator and its application in the photocuring system; the beneficial effects of the present invention are: ① The photoinitiator prepared by the present invention has significantly extended ultraviolet absorption wavelength, In the wavelength range of the light source, it has good ultraviolet absorption capacity. ② The photoinitiator prepared by the present invention has obvious anti-oxidation and polymerization inhibition effect. ③The migration stability of the photoinitiator prepared by the invention is obviously improved.


Klaim utama: Hidrogen-donor-mengandung fotoinisiator turunan thioeter naftalimida yang cocok untuk pengawetan aerobik LED-UV, dicirikan bahwa donor-yang mengandung hidrogen- sulfida naftalimida Rumus struktur dari fotoinisiator turunan amina adalah sebagai berikut: nilai n berkisar dari 1 sampai 10; kisaran nilai n lebih disukai 1 sampai 5; nilai n paling disukai 1; R1 dipilih dari C3-C20 Alkil lemak, hidroksil, vinil, propenil, metil, etil, alkoksi, halogen, aralkil atau fenil, lebih disukai R1 adalah vinil, metil; R2 dipilih dari karboksil, benzoil, Asetil, akril, metoksi, etoksi, nitro, lebih disukai R2 adalah metoksi.